Glossary
Instruments and signals
| Term |
Meaning in this portal |
| AFM |
Atomic force microscopy: scanning a tip-sample interaction while a feedback loop controls a measured observable. |
| SPM |
Scanning probe microscopy, the broader family that includes AFM and KPFM. |
| Cantilever |
Microfabricated elastic beam carrying the tip; its modal stiffness is \(k\) (N m\(^{-1}\)). |
| Deflection sensitivity / InVOLS |
Conversion from detector voltage to cantilever deflection, normally m V\(^{-1}\). |
| Feedback setpoint |
Target observable maintained by the controller; its physical meaning depends on the operating mode. |
| Forward / backward scan |
Opposite fast-axis scan directions. Their difference can reveal lag, drift, and feedback artifacts. |
| Optical lever |
Laser, cantilever, and segmented photodiode arrangement used to infer cantilever angle or deflection. |
| Scanner |
Piezoelectric positioning system moving the tip or sample along calibrated axes. |
| Topography |
Reconstructed feedback height channel, not a direct photograph of an unconvolved surface. |
Force spectroscopy and mechanics
| Symbol or term |
Definition and unit |
| \(F\) |
Normal force, N. |
| \(d\) |
Cantilever deflection, m. |
| \(\delta\) |
Sample indentation under the chosen contact convention, m. |
| \(E\), \(E^*\) |
Sample Young's modulus and reduced modulus, Pa. |
| \(\nu\) |
Poisson ratio, dimensionless. |
| \(R\) |
Spherical or paraboloidal tip radius, m. |
| \(\alpha\) |
Conical tip half-angle, rad. |
| \(a\) |
Contact radius in an adhesive-contact model, m. |
| \(w\) |
Work of adhesion per area, J m\(^{-2}\). |
| Baseline |
Non-contact reference fitted and subtracted before segmentation or fitting. |
| Contact point |
Estimated transition defining the indentation origin; a fitted quantity with uncertainty, not an observed truth. |
| DMT |
Derjaguin-Muller-Toporov adhesive-contact regime; SPM-Kit exposes a declared spherical-plus-offset approximation. |
| Hertz |
Non-adhesive elastic contact model used here for a spherical/paraboloidal tip. |
| Hysteresis |
Difference between compatible approach and retract paths; integrated force-distance area has units J. |
| JKR |
Johnson-Kendall-Roberts adhesive-contact model; SPM-Kit's route is experimental. |
| Pull-off |
Detachment event; the negative minimum after baseline correction is used as an operational adhesion magnitude. |
| Snap-in |
Sudden transition toward the surface when the attractive gradient overcomes the cantilever response. |
| Sneddon |
Axisymmetric indentation solution used here for ideal conical contact. |
Surface and electrical analysis
| Symbol or term |
Definition and unit |
| CPD, \(V_{\mathrm{CPD}}\) |
Contact-potential difference, V; sign convention must be confirmed for the instrument. |
| \(\phi\) |
Work function, normally eV in KPFM reporting. |
| KPFM |
Kelvin probe force microscopy, an electrical-feedback SPM mode mapping a CPD-related observable. |
| \(S_a\) |
Arithmetic mean absolute areal height deviation, same length unit as the height channel. |
| \(S_q\) |
Root-mean-square areal height deviation, length. |
| \(S_z\) |
Maximum areal height range under this implementation, length. |
| \(S_{sk}\), \(S_{ku}\) |
Height-distribution skewness and kurtosis, dimensionless. |
| Leveling |
Removing a declared reference form such as a plane or row offset. It changes reported statistics and low-frequency spectra. |
| Mask |
Declared inclusion or exclusion set over a field. A mask changes the population being measured. |
| Pixel pitch |
Lateral sample spacing, m pixel\(^{-1}\), derived from range and grid dimensions. |
Spectra and resonance
| Symbol or term |
Definition and unit |
| PSD |
Power spectral density; normalization and dimensional convention must accompany comparisons. |
| \(q\) |
Spatial frequency, m\(^{-1}\) under the cycles-per-length convention used here. |
| \(H\) |
Hurst exponent of a declared self-affine fit, dimensionless. |
| \(D\) |
Surface fractal dimension inferred here as \(3-H\), dimensionless and model-dependent. |
| \(\xi\) |
Correlation length estimate, m, under a declared estimator and threshold. |
| \(f_0\) |
Resonance frequency, Hz. |
| \(Q\) |
Quality factor, \(f_0/\Delta f_{\mathrm{FWHM}}\), dimensionless. |
| \(m_{\mathrm{eff}}\) |
Effective modal mass under a one-mode oscillator model, kg. |
| ASD |
Amplitude spectral density, commonly m Hz\(^{-1/2}\) after calibration. |
| Thermal tuning |
Estimating modal properties or stiffness from a calibrated thermal-noise spectrum. |
| d² law |
Linear diameter-squared evaporation diagnostic, \(d^2=d_0^2-Kt\), under diffusion-limited assumptions. |
Software and evidence
| Term |
Meaning |
| Artifact contract |
Declared file, schema, units, hashes, and provenance passed between tools. |
| Candidate dataset |
Located material requiring licensing, suitability, integrity, and campaign review; not automatically accepted evidence. |
| Core |
Presentation-independent SPM-Kit numerical and I/O package. |
| Fathom |
Interactive workspace that invokes public SPM-Kit Core paths. |
| Level 1–5 |
Claim-scoped evidence vocabulary from software verification through independent reproducibility; see scientific status. |
| Phantom |
Deterministic synthetic fixture with declared truth. It is not a physical reference. |
| Provenance |
Source, version, parameters, units, transformations, environment, and checksums needed to inspect an artifact chain. |
| System under test |
Installed public package or command invoked by a validation campaign without importing private internals. |
Implementation map ·
References